发明授权
- 专利标题： Nanoprint equipment and method of making fine structure
- 专利标题（中）： 纳米设备制作精细结构的方法
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申请号： US10801579申请日： 2004-03-17
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公开(公告)号： US07520742B2公开(公告)日： 2009-04-21
- 发明人: Shigehisa Motowaki , Akihiro Miyauchi , Masahiko Ogino , Kosuke Kuwabara
- 申请人： Shigehisa Motowaki , Akihiro Miyauchi , Masahiko Ogino , Kosuke Kuwabara
- 申请人地址： JP Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Antonelli, Terry, Stout & Kraus, LLP.
- 优先权： JP2003-077295 20030320
- 主分类号： B29C33/00
- IPC分类号： B29C33/00 ; B29C59/02
摘要：
A pillar with a high aspect ratio is transferred by a nanoprinting method. In order to form a fine structure on a substrate, a nanoprinting apparatus heats and presses the substrate and a mold with a fine concave-convex pattern formed thereon, the mold having a mechanism for transferring and applying a mold-releasing agent. A method for transferring a fine structure using the aforementioned nanoprinting apparatus.
公开/授权文献
- US20040182820A1 Nanoprint equipment and method of making fine structure 公开/授权日：2004-09-23