发明授权
- 专利标题: Phase change memory devices with contact surface area to a phase changeable material defined by a sidewall of an electrode hole and methods of forming the same
- 专利标题(中): 具有由电极孔的侧壁限定的相变材料的接触表面积的相变存储器件及其形成方法
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申请号: US10942187申请日: 2004-09-16
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公开(公告)号: US07521706B2公开(公告)日: 2009-04-21
- 发明人: Won-Cheol Jeong , Hyeong-Jun Kim , Jae-Hyun Park , Chang-Wook Jeong
- 申请人: Won-Cheol Jeong , Hyeong-Jun Kim , Jae-Hyun Park , Chang-Wook Jeong
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel Sibley & Sajovec
- 优先权: KR10-2003-0083551 20031124
- 主分类号: H01L47/00
- IPC分类号: H01L47/00 ; H01L29/02 ; H01L29/04
摘要:
Phase change memory devices and methods of making phase changeable memory devices including a heating electrode disposed on a substrate are provided. The heating electrode includes an electrode hole in the heating electrode. A phase change material pattern is provided in the electrode hole and contacts a sidewall of the electrode hole. In some embodiments, the electrode hole extends through the heating electrode. In some embodiments, the phase changeable material pattern only contacts the electrode at a sidewall of the electrode hole.
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