发明授权
- 专利标题: Protection of seedlayer for electroplating
- 专利标题(中): 保护电镀层
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申请号: US11336169申请日: 2006-01-19
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公开(公告)号: US07525196B2公开(公告)日: 2009-04-28
- 发明人: Valery M. Dubin , Peter K. Moon
- 申请人: Valery M. Dubin , Peter K. Moon
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 代理商 George Chen
- 主分类号: H01L23/48
- IPC分类号: H01L23/48
摘要:
The present invention includes a method of providing a substrate; sequentially forming a seed layer over the substrate and forming a protection layer over the seed layer; and sequentially removing the protection layer and forming a conductor over the seed layer.The present invention further includes a structure having a substrate, the substrate having a device; an insulator disposed over the substrate, the insulator having an opening, the opening disposed over the device; a barrier layer disposed over the opening; a seed layer disposed over the barrier layer; and a protection layer disposed over the seed layer.
公开/授权文献
- US20060131750A1 Protection of seedlayer for electroplating 公开/授权日:2006-06-22
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