Invention Grant
US07525732B2 Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part
有权
用于形成精细结构的部件，由此形成的精细结构的部件的方法和使用这种精细结构的部件的产品
- Patent Title: Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part
- Patent Title (中): 用于形成精细结构的部件，由此形成的精细结构的部件的方法和使用这种精细结构的部件的产品
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Application No.: US11843677Application Date: 2007-08-23
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Publication No.: US07525732B2Publication Date: 2009-04-28
- Inventor: Shin-ichi Uehara , Yuko Sato , Ken Sumiyoshi , Setsuo Kaneko , Jin Matsushima
- Applicant: Shin-ichi Uehara , Yuko Sato , Ken Sumiyoshi , Setsuo Kaneko , Jin Matsushima
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Agency: Young & Thompson
- Priority: JP2002-109447 20020411
- Main IPC: G02B5/08
- IPC: G02B5/08 ; G02B3/00
Abstract:
In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
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