发明授权
- 专利标题： Highly symmetric optical structures
- 专利标题（中）： 高度对称的光学结构
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申请号： US11778434申请日： 2007-07-16
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公开(公告)号： US07526151B1公开(公告)日： 2009-04-28
- 发明人: Brent E. Little , Wei Chen , John V. Hryniewicz , Wenlu Chen , David M. Gill , Oliver King , Roy R. Davidson
- 申请人： Brent E. Little , Wei Chen , John V. Hryniewicz , Wenlu Chen , David M. Gill , Oliver King , Roy R. Davidson
- 申请人地址： US CA Sunnyvale
- 专利权人： Infinera Corporation
- 当前专利权人： Infinera Corporation
- 当前专利权人地址： US CA Sunnyvale
- 代理商 W. Douglas Carothers, Jr.; David L. Soltz
- 主分类号： G02B6/12
- IPC分类号： G02B6/12
摘要：
An intermediate structure used to form an integrated optics device comprising a substrate, a cladding on the substrate, at least one real waveguide on the cladding, and at least one dummy waveguide optically coupled with the real waveguide. The real waveguide forms a part of a predetermined planar lightwave circuit. The dummy waveguide does not form a part of the predetermined planar lightwave circuit.
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