发明授权
US07529631B2 Defect detection system, defect detection method, and defect detection program
失效
缺陷检测系统,缺陷检测方法和缺陷检测程序
- 专利标题: Defect detection system, defect detection method, and defect detection program
- 专利标题(中): 缺陷检测系统,缺陷检测方法和缺陷检测程序
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申请号: US11812398申请日: 2007-06-19
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公开(公告)号: US07529631B2公开(公告)日: 2009-05-05
- 发明人: Hiroshi Matsushita , Yasutaka Arakawa , Junji Sugamoto
- 申请人: Hiroshi Matsushita , Yasutaka Arakawa , Junji Sugamoto
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权: JP2006-170677 20060620
- 主分类号: G01B5/30
- IPC分类号: G01B5/30
摘要:
A defect detection system includes a data acquiring section that acquires time series data of device parameter of each manufacturing device including an exposure device, and information on defect distribution in an area with a size smaller than a chip area size, a pattern classifying section that assembles the information on the defect distribution in units of shot or chip areas, and classifies the distributions to a defect pattern, a feature quantity calculating section that processes the time series data and calculates a feature quantity, a significant difference test section that calculates occurrence frequency distributions of the shot or chip area wherein the defect pattern to the feature quantity exists and does not exist, respectively, and determines the presence/absence of significant difference between the frequency distributions, and a defect detecting section that detects the device parameter corresponding to the feature quantity as the cause of defect of the defect pattern.
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