Invention Grant
- Patent Title: In situ cleaning process for field effect device spacers
- Patent Title (中): 场效应器件间隔物的原位清洗工艺
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Application No.: US11288824Application Date: 2005-11-28
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Publication No.: US07530875B2Publication Date: 2009-05-12
- Inventor: Hao Li , James E. Jaskie
- Applicant: Hao Li , James E. Jaskie
- Applicant Address: US IL Schaumburg
- Assignee: Motorola, Inc.
- Current Assignee: Motorola, Inc.
- Current Assignee Address: US IL Schaumburg
- Main IPC: H01J9/38
- IPC: H01J9/38 ; H01J1/62
Abstract:
A method is provided for in situ cleaning of spacers (42) separating an anode (14) and cathode (12) of a flat panel display (10) in a vacuum by impacting electrons upon the spacers (42).
Public/Granted literature
- US20070123136A1 In situ cleaning process for field effect device spacers Public/Granted day:2007-05-31
Information query
