发明授权
US07535027B2 Amorphous-silicon thin film transistor and shift resister having the same
有权
非晶硅薄膜晶体管和具有相同功能的移位寄存器
- 专利标题: Amorphous-silicon thin film transistor and shift resister having the same
- 专利标题(中): 非晶硅薄膜晶体管和具有相同功能的移位寄存器
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申请号: US11056259申请日: 2005-02-14
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公开(公告)号: US07535027B2公开(公告)日: 2009-05-19
- 发明人: Seung-Hwan Moon , Back-Won Lee
- 申请人: Seung-Hwan Moon , Back-Won Lee
- 申请人地址: KR Kyungki-do
- 专利权人: Samsung Electronics, Co., Ltd.
- 当前专利权人: Samsung Electronics, Co., Ltd.
- 当前专利权人地址: KR Kyungki-do
- 代理机构: Macpherson Kwok Chen & Heid LLP
- 代理商 Mark A. Pellegrini
- 优先权: KR10-2003-0013363 20030304
- 主分类号: H01L27/15
- IPC分类号: H01L27/15
摘要:
An amorphous-silicon thin film transistor and a shift register shift having the amorphous-silicon TFT include a first conductive region, a second conductive region and a third conductive region. The first conductive region is formed on a first plane spaced apart from a substrate by a first distance. The second conductive region is formed on a second plane spaced apart from the substrate by a second distance. The second conductive region includes a body conductive region and two hand conductive regions elongated from both ends of the body conductive region to form an LI-shape. The third conductive region is formed on the second plane. The third conductive region includes an elongated portion. The elongated portion is disposed between the two hand conductive regions of the second conductive region. The amorphous-silicon TFT and the shift register having the amorphous TFT reduce a parasitic capacitance between the gate electrode and drain electrode.
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