Invention Grant
US07535035B2 Cross-point nonvolatile memory devices using binary metal oxide layer as data storage material layer and methods of fabricating the same
有权
使用二元金属氧化物层作为数据存储材料层的交叉点非易失性存储器件及其制造方法
- Patent Title: Cross-point nonvolatile memory devices using binary metal oxide layer as data storage material layer and methods of fabricating the same
- Patent Title (中): 使用二元金属氧化物层作为数据存储材料层的交叉点非易失性存储器件及其制造方法
-
Application No.: US11241604Application Date: 2005-09-30
-
Publication No.: US07535035B2Publication Date: 2009-05-19
- Inventor: In-Gyu Baek , Moon-Sook Lee
- Applicant: In-Gyu Baek , Moon-Sook Lee
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2004-0091554 20041110
- Main IPC: H01L29/73
- IPC: H01L29/73 ; H01L21/82

Abstract:
A cross-point nonvolatile memory device using a binary metal oxide layer as a data storage material layer includes spaced apart doped lines disposed in a substrate. Spaced apart upper electrodes cross over the doped lines such that cross points are formed where the upper electrodes overlap the doped lines. Lower electrodes are disposed at the cross points between the doped lines and the upper electrodes. A binary metal oxide layer is provided between the upper electrodes and the lower electrodes and provided as a data storage material layer. Doped regions are provided between the lower electrodes and the doped lines and form diodes together with the doped lines. The doped regions have an opposite polarity to the doped lines.
Public/Granted literature
Information query
IPC分类: