发明授权
- 专利标题： Cleaning solution for substrate for semiconductor device and cleaning method
- 专利标题（中）： 半导体器件用基板清洗液及清洗方法
-
申请号： US11500356申请日： 2006-08-08
-
公开(公告)号： US07541322B2公开(公告)日： 2009-06-02
- 发明人: Makoto Ikemoto , Hitoshi Morinaga
- 申请人： Makoto Ikemoto , Hitoshi Morinaga
- 申请人地址： JP Tokyo
- 专利权人： Mitsubishi Chemical Corporation
- 当前专利权人： Mitsubishi Chemical Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权： JP2004-032222 20040209
- 主分类号： C11D7/32
- IPC分类号： C11D7/32
摘要：
To provide a cleaning solution for a substrate for a semiconductor device capable of removing particle contamination, organic contamination and metal contamination at the same time without corroding the substrate surface, and further having good water rinsability and capable of making the substrate surface highly clean in a short time, and a cleaning method.
公开/授权文献
信息查询
