发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US10719683申请日： 2003-11-24
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公开(公告)号： US07545481B2公开(公告)日： 2009-06-09
- 发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bernard Gellrich
- 申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bernard Gellrich
- 申请人地址： NL Veldhoven DE Oberkochen
- 专利权人： ASML Netherlands B.V.,Carl Zeiss SMT AG
- 当前专利权人： ASML Netherlands B.V.,Carl Zeiss SMT AG
- 当前专利权人地址： NL Veldhoven DE Oberkochen
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/54
- IPC分类号： G03B27/54 ; G03B27/58
摘要：
The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
公开/授权文献
- US20050110973A1 Lithographic apparatus and device manufacturing method 公开/授权日：2005-05-26
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