发明授权
US07547360B2 Reduction of carbon inclusions in sublimation grown SiC single crystals
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在升华生长的SiC单晶中减少碳夹杂物
- 专利标题: Reduction of carbon inclusions in sublimation grown SiC single crystals
- 专利标题(中): 在升华生长的SiC单晶中减少碳夹杂物
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申请号: US11904593申请日: 2007-09-27
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公开(公告)号: US07547360B2公开(公告)日: 2009-06-16
- 发明人: Avinash K. Gupta , Edward Semenas , Ilya Zwieback
- 申请人: Avinash K. Gupta , Edward Semenas , Ilya Zwieback
- 申请人地址: US PA Saxonburg
- 专利权人: II-VI Incorporated
- 当前专利权人: II-VI Incorporated
- 当前专利权人地址: US PA Saxonburg
- 代理机构: The Webb Law Firm
- 主分类号: C30B25/12
- IPC分类号: C30B25/12
摘要:
In a method of SiC single crystal growth, a SiC single crystal seed and polycrystalline SiC source material are provided in spaced relation inside of a graphite growth crucible along with at least one compound capable of forming SiO gas in the growth crucible. The growth crucible is heated whereupon the gaseous SiO forms and reacts with carbon in the growth crucible thereby avoiding the introduction of carbon into the SiC single crystal before and during the growth thereof and the SiC source material vaporizes and is transported via a temperature gradient in the growth crucible to the seed crystal where it precipitates and forms a SiC single crystal.
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