发明授权
- 专利标题: Inspection probe
- 专利标题(中): 检查探针
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申请号: US10553580申请日: 2004-04-15
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公开(公告)号: US07548082B2公开(公告)日: 2009-06-16
- 发明人: Michinobu Tanioka , Atsuo Hattori
- 申请人: Michinobu Tanioka , Atsuo Hattori
- 申请人地址: JP Tokyo
- 专利权人: NEC Corporation
- 当前专利权人: NEC Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Scully, Scott, Murphy & Presser, P.C.
- 优先权: JP2003-109843 20030415
- 国际申请: PCT/JP2004/005347 WO 20040415
- 国际公布: WO2004/092749 WO 20041028
- 主分类号: G01R31/02
- IPC分类号: G01R31/02
摘要:
A conventional inspection probe has posed such problems that, when a pitch is as fine as up to 40 μm, a positional accuracy is difficult to ensure depending on constituting materials and a production method, pin breaking occurs when fine-diameter pins contact, a good contact cannot be obtained due to an insufficient contact, an durability is insufficient. An inspection probe having a probe structure comprising an elastic probe pin, a wiring layer carrying substrate, a backup plate to install a substrate thereon, an inspection substrate and a flexible substrate, characterized in that a good-contact material layer according to the electrode material of a semiconductor device is formed at the tip end of a probe pin and a wiring layer has a structure formed of a low-resistance metal layer, with the good-contact material layer being separated from the low-resistance metal layer. Such a structure can provide very high contact reliability and mechanical durability at a pitch as very fine as up to 40 μm.
公开/授权文献
- US20060208752A1 Inspection probe 公开/授权日:2006-09-21
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