- 专利标题: Apparatus and reactor for generating and feeding high purity moisture
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申请号: US11460087申请日: 2006-07-26
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公开(公告)号: US07553459B2公开(公告)日: 2009-06-30
- 发明人: Tadahiro Ohmi , Nobukazu Ikeda , Yukio Minami , Kouji Kawada , Katunori Komehana , Teruo Honiden , Touru Hirai , Akihiro Morimoto , Toshirou Nariai , Keiji Hirao , Masaharu Taguchi , Osamu Nakamura
- 申请人: Tadahiro Ohmi , Nobukazu Ikeda , Yukio Minami , Kouji Kawada , Katunori Komehana , Teruo Honiden , Touru Hirai , Akihiro Morimoto , Toshirou Nariai , Keiji Hirao , Masaharu Taguchi , Osamu Nakamura
- 申请人地址: JP Osaka-shi JP Sendai-shi
- 专利权人: Fujikin Incorporated,Tadahiro Ohmi
- 当前专利权人: Fujikin Incorporated,Tadahiro Ohmi
- 当前专利权人地址: JP Osaka-shi JP Sendai-shi
- 优先权: JP11-223548 19990806; JP11-338882 19991130
- 主分类号: B01J10/00
- IPC分类号: B01J10/00 ; B01J8/00 ; C01B5/00
摘要:
A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
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