A pellicle frame for pellicle for use with a photomask in a wafer lithographic processing process is disclosed to have the frame body made of a material containing silver that absorbs sulfide released from other materials of the pellicle, preventing formation of crystals on the mask pattern of the photomask after exposure. In an alternate form, the pellicle frame is made of aluminum alloy, ceramics, or stainless steel, and then coated with a layer of silver and a black coating of polymer, for example, Teflon, PEEK (Polyaryletherketone) or PFA (Perfluoroalkoxy).