Invention Grant
- Patent Title: Digital lithography using real time quality control
- Patent Title (中): 数字光刻使用实时质量控制
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Application No.: US11204648Application Date: 2005-08-15
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Publication No.: US07559619B2Publication Date: 2009-07-14
- Inventor: Steven E. Ready , William S. Wong , Scott J. H. Limb
- Applicant: Steven E. Ready , William S. Wong , Scott J. H. Limb
- Applicant Address: US CA Palo Alto
- Assignee: Palo Alto Research Center Incorporated
- Current Assignee: Palo Alto Research Center Incorporated
- Current Assignee Address: US CA Palo Alto
- Agency: Bever, Hoffman & Harms, LLP
- Agent Patrick R. Bever
- Main IPC: B41J29/393
- IPC: B41J29/393

Abstract:
A digital lithography system including a droplet source (printhead) for selectively ejecting liquid droplets of a phase-change masking material, and an imaging system for capturing (generating) image data representing printed features formed by the ejected liquid droplets. The system also includes a digital control system that detects defects in the printed features, for example, by comparing the image data with stored image data. The digital control system then modifies the printed feature to correct the defect, for example, by moving the printhead over the defect and causing the printhead to eject droplets onto the defect's location. In one embodiment, a single-printhead secondary printer operates in conjunction with a multi-printhead main printer to correct defects.
Public/Granted literature
- US20090185018A9 DIGITAL LITHOGRAPHY USING REAL TIME QUALITY CONTROL Public/Granted day:2009-07-23
Information query
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