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公开(公告)号：US07559619B2
公开(公告)日：2009-07-14
申请号：US11204648
申请日：2005-08-15
IPC分类号： B41J29/393
CPC分类号： B41J2/2139 , B81C99/0065 , B81C2201/0184 , B81C2201/0198
摘要： A digital lithography system including a droplet source (printhead) for selectively ejecting liquid droplets of a phase-change masking material, and an imaging system for capturing (generating) image data representing printed features formed by the ejected liquid droplets. The system also includes a digital control system that detects defects in the printed features, for example, by comparing the image data with stored image data. The digital control system then modifies the printed feature to correct the defect, for example, by moving the printhead over the defect and causing the printhead to eject droplets onto the defect's location. In one embodiment, a single-printhead secondary printer operates in conjunction with a multi-printhead main printer to correct defects.
摘要翻译： 一种数字光刻系统，包括用于选择性地喷射相变掩模材料的液滴的液滴源（打印头）和用于捕获（产生）表示喷射液滴形成的打印特征的图像数据的成像系统。 该系统还包括数字控制系统，其检测打印特征中的缺陷，例如通过将图像数据与存储的图像数据进行比较。 然后，数字控制系统修改打印的特征以校正缺陷，例如通过将打印头移动到缺陷上并使打印头将液滴喷射到缺陷的位置上。 在一个实施例中，单打印头二次打印机与多打印头主打印机一起操作以校正缺陷。
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公开(公告)号：US6156435A
公开(公告)日：2000-12-05
申请号：US280377
申请日：1999-03-29
IPC分类号： B05D7/24 , C08F2/46 , C23C16/46 , C23C16/515 , H01L21/312 , H01L23/532 , B32B27/00
CPC分类号： C23C16/463 , B05D1/62 , C23C16/46 , C23C16/515 , H01L21/3127 , H01L23/5329 , H01L2924/0002 , Y10T428/21 , Y10T428/2933 , Y10T428/2938 , Y10T428/3154 , Y10T428/31544
摘要： Provided are methods for forming a fluorocarbon polymer thin film on the surface of a structure. In one method, a monomer gas is exposed to a source of heat having a temperature sufficient to pyrolyze the monomer gas and produce a source of reactive CF.sub.2 species in the vicinity of the structure surface. The structure surface is maintained substantially at a temperature lower than that of the heat source to induce deposition and polymerization of the CF.sub.2 species on the structure surface. In another method for forming a fluorocarbon polymer thin film, the structure is exposed to a plasma environment in which a monomer gas is ionized to produce reactive CF.sub.2 species. The plasma environment is produced by application to the monomer gas of plasma excitation power characterized by an excitation duty cycle having alternating intervals in which excitation power is applied and in which no excitation power is applied to the monomer gas. The monomer gas employed in the methods preferably includes hexafluoropropylene oxide. The monomer gas pyrolysis and plasma excitation methods can be carried out individually, sequentially, or simultaneously. Flexible fluorocarbon polymer thin films can thusly be produced on wires, twisted wires, neural probes, tubing, complex microstructures, substrates, microfabricated circuits, and other structures. The thin films have a compositional CF.sub.2 fraction of at least about 50%, a dielectric constant of less than about 1.95, and a crosslinking density of less than about 35%.
摘要翻译： 提供了在结构的表面上形成氟碳聚合物薄膜的方法。 在一种方法中，将单体气体暴露于具有足以热解单体气体并在结构表面附近产生反应性CF 2物质源的热源。 结构表面基本保持在比热源低的温度下，以引起CF2物质在结构表面上的沉积和聚合。 在形成氟碳聚合物薄膜的另一种方法中，该结构暴露于其中单体气体被离子化以产生反应性CF 2物质的等离子体环境中。 等离子体环境通过应用于等离子体激发功率的单体气体产生，其特征在于具有施加激发功率的交替间隔的激发占空比，并且其中没有激发功率施加到单体气体。 在该方法中使用的单体气体优选包括六氟环氧丙烷。 单体气体热解和等离子体激发方法可以单独，顺序或同时进行。 柔性氟碳聚合物薄膜因此可以在电线，绞线，神经探针，管道，复合微结构，基板，微结构电路和其他结构上生产。 薄膜具有至少约50％的组成CF 2分数，小于约1.95的介电常数和小于约35％的交联密度。
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公开(公告)号：US06153269A
公开(公告)日：2000-11-28
申请号：US280196
申请日：1999-03-29
IPC分类号： B05D7/24 , C08F2/46 , C23C16/46 , C23C16/515 , H01L21/312 , H01L23/532 , C08J7/18
CPC分类号： C23C16/463 , B05D1/62 , C23C16/46 , C23C16/515 , H01L21/3127 , H01L23/5329 , H01L2924/0002 , Y10T428/21 , Y10T428/2933 , Y10T428/2938 , Y10T428/3154 , Y10T428/31544
摘要： Provided are methods for forming a fluorocarbon polymer thin film on the surface of a structure. In one method, a monomer gas is exposed to a source of heat having a temperature sufficient to pyrolyze the monomer gas and produce a source of reactive CF.sub.2 species in the vicinity of the structure surface. The structure surface is maintained substantially at a temperature lower than that of the heat source to induce deposition and polymerization of the CF.sub.2 species on the structure surface. In another method for forming a fluorocarbon polymer thin film, the structure is exposed to a plasma environment in which a monomer gas is ionized to produce reactive CF.sub.2 species. The plasma environment is produced by application to the monomer gas of plasma excitation power characterized by an excitation duty cycle having alternating intervals in which excitation power is applied and in which no excitation power is applied to the monomer gas. The monomer gas employed in the methods preferably includes hexafluoropropylene oxide. The monomer gas pyrolysis and plasma excitation methods can be carried out individually, sequentially, or simultaneously. Flexible fluorocarbon polymer thin films can thusly be produced on wires, twisted wires, neural probes, tubing, complex microstructures, substrates, microfabricated circuits, and other structures. The thin films have a compositional CF.sub.2 fraction of at least about 50%, a dielectric constant of less than about 1.95, and a crosslinking density of less than about 35%.
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