发明授权
- 专利标题： Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
- 专利标题（中）： 用于去除光学元件上的沉积的方法，用于保护光学元件的方法，器件制造方法，包括光学元件的设备和光刻设备
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申请号： US11207996申请日： 2005-08-22
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公开(公告)号： US07561247B2公开(公告)日： 2009-07-14
- 发明人: Maarten Marinus Johannes Wilhelmus Van Herpen , Carolus Ida Maria Antonius Spee , Derk Jan Wilfred Klunder , Antonius Maria Bernardus De Mol
- 申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Carolus Ida Maria Antonius Spee , Derk Jan Wilfred Klunder , Antonius Maria Bernardus De Mol
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/42
摘要：
A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas and one or more additional compounds selected from the group of hydrocarbon compounds and silane compounds in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.
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