Invention Grant
US07566422B2 Exposure apparatus with tanks storing helium gas and method of manufacturing device using exposure apparatus
失效
带有储存氦气的储罐的曝光装置和使用曝光装置的制造装置的方法
- Patent Title: Exposure apparatus with tanks storing helium gas and method of manufacturing device using exposure apparatus
- Patent Title (中): 带有储存氦气的储罐的曝光装置和使用曝光装置的制造装置的方法
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Application No.: US11201142Application Date: 2005-08-11
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Publication No.: US07566422B2Publication Date: 2009-07-28
- Inventor: Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
- Applicant: Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP10-060591 19980225; JP10-060708 19980225; JP10-060723 19980225; JP11-015102 19990125
- Main IPC: G05D16/00
- IPC: G05D16/00 ; C23C14/00
Abstract:
A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
Public/Granted literature
- US20050271558A1 Processing apparatus, measuring apparatus, and device manufacturing method Public/Granted day:2005-12-08
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