Invention Grant
US07566642B2 Process of manufacturing an N-type Schottky barrier tunnel transistor
有权
制造N型肖特基势垒隧道晶体管的工艺
- Patent Title: Process of manufacturing an N-type Schottky barrier tunnel transistor
- Patent Title (中): 制造N型肖特基势垒隧道晶体管的工艺
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Application No.: US11188076Application Date: 2005-07-22
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Publication No.: US07566642B2Publication Date: 2009-07-28
- Inventor: Yark Yeon Kim , Moon Gyu Jang , Jae Heon Shin , Seong Jae Lee
- Applicant: Yark Yeon Kim , Moon Gyu Jang , Jae Heon Shin , Seong Jae Lee
- Applicant Address: KR Daejeon
- Assignee: Electronics and Telecommunications Research Institute
- Current Assignee: Electronics and Telecommunications Research Institute
- Current Assignee Address: KR Daejeon
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Priority: KR10-2004-0109298 20041221
- Main IPC: H01L21/44
- IPC: H01L21/44

Abstract:
An n-type SBTT and a manufacturing method thereof are provided. The SBTT includes a silicon layer, a gate, a double layer that has a rare-earth metal silicide layer and a transition metal silicide layer. The silicon layer has a channel region. The gate is formed in an overlapping manner on the channel region and has a gate dielectric layer on its interface with respect to the silicon layer. The double layer is formed as a source/drain that has the channel region interposed on the silicon layer.
Public/Granted literature
- US20060131664A1 N-type schottky barrier tunnel transistor and manufacturing method thereof Public/Granted day:2006-06-22
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