Invention Grant
US07566642B2 Process of manufacturing an N-type Schottky barrier tunnel transistor 有权
制造N型肖特基势垒隧道晶体管的工艺

Process of manufacturing an N-type Schottky barrier tunnel transistor
Abstract:
An n-type SBTT and a manufacturing method thereof are provided. The SBTT includes a silicon layer, a gate, a double layer that has a rare-earth metal silicide layer and a transition metal silicide layer. The silicon layer has a channel region. The gate is formed in an overlapping manner on the channel region and has a gate dielectric layer on its interface with respect to the silicon layer. The double layer is formed as a source/drain that has the channel region interposed on the silicon layer.
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