发明授权
- 专利标题: Photosensitive composition and cured products thereof
- 专利标题(中): 光敏组合物及其固化产物
-
申请号: US10567355申请日: 2004-08-18
-
公开(公告)号: US07569260B2公开(公告)日: 2009-08-04
- 发明人: Kuon Miyazaki , Hideaki Takahashi
- 申请人: Kuon Miyazaki , Hideaki Takahashi
- 申请人地址: JP Tokyo
- 专利权人: Asahi Kasei Chemicals Corporation
- 当前专利权人: Asahi Kasei Chemicals Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Greenblum & Bernstein, P.L.C.
- 优先权: JP2003-297165 20030821; JP2004-099100 20040330
- 国际申请: PCT/JP2004/011848 WO 20040818
- 国际公布: WO2005/019299 WO 20050303
- 主分类号: C09K10/00
- IPC分类号: C09K10/00 ; C08L63/00
摘要:
There is provided a photosensitive composition excellent in photo-curability which comprises an epoxy compound having two or more epoxy groups, a polynuclear phenol compound having a specific structure and an energy beam-sensitive cationic polymerization initiator, and optionally a predetermined percentage of a hydroxyl group-containing compound having one or more hydroxyl groups and one or more of at least one of a vinyl ether group and an oxetanyl group in a molecule, and a cured product of the same whose film is excellent in adhesion to various substrates, water resistance and flexibility.
公开/授权文献
- US20060222999A1 Photosensitive composition and cured products thereof 公开/授权日:2006-10-05