发明授权
US07569325B2 Monomer having sulfonyl group, polymer thereof and photoresist composition including the same
失效
具有磺酰基的单体，其聚合物和包含它们的光致抗蚀剂组合物
- 专利标题： Monomer having sulfonyl group, polymer thereof and photoresist composition including the same
- 专利标题（中）： 具有磺酰基的单体，其聚合物和包含它们的光致抗蚀剂组合物
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申请号： US11923392申请日： 2007-10-24
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公开(公告)号： US07569325B2公开(公告)日： 2009-08-04
- 发明人: Jung-Youl Lee , Geun-Jong Yu , Sang-Jung Kim , Jae-Woo Lee , Deog-Bae Kim , Jae-Hyun Kim
- 申请人： Jung-Youl Lee , Geun-Jong Yu , Sang-Jung Kim , Jae-Woo Lee , Deog-Bae Kim , Jae-Hyun Kim
- 申请人地址： KR Incheon
- 专利权人： Dongjin Semichem Co., Ltd.
- 当前专利权人： Dongjin Semichem Co., Ltd.
- 当前专利权人地址： KR Incheon
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： KR10-2006-0103783 20061025
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/30 ; C08F226/00 ; C07D487/00 ; C07C303/28
摘要：
A photoresist monomer having a sulfonyl group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula. wherein, R* is a hydrogen atom or a methyl group, R1 and R2 are independently a C1˜C20 alkyl group, a C4˜C20 cycloalkyl group, a C6˜C20 aryl group or a C7˜C20 arylalkyl group, one of R1 and R2 may not exist, and R1 and R2 can be connected to form a ring.
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