发明授权
- 专利标题: Through-hole via on saw streets
- 专利标题(中): 通孔通过锯道
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申请号: US11744657申请日: 2007-05-04
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公开(公告)号: US07569421B2公开(公告)日: 2009-08-04
- 发明人: Byung Tai Do , Heap Hoe Kuan
- 申请人: Byung Tai Do , Heap Hoe Kuan
- 申请人地址: SG Singapore
- 专利权人: STATS ChipPAC, Ltd.
- 当前专利权人: STATS ChipPAC, Ltd.
- 当前专利权人地址: SG Singapore
- 代理商 Robert D. Atkins
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A semiconductor device is manufactured by, first, providing a wafer designated with a saw street guide. The wafer is taped with a dicing tape. The wafer is singulated along the saw street guide into a plurality of dies having a plurality of gaps between each of the plurality of dies. The dicing tape is stretched to expand the plurality of gaps to a predetermined distance. An organic material is deposited into each of the plurality of gaps. A top surface of the organic material is substantially coplanar with a top surface of a first die of the plurality of dies. A plurality of via holes is formed in the organic material. Each of the plurality of via holes is patterned to each of a plurality of bond pad locations on the plurality of dies. A conductive material is deposited in each of the plurality of via holes.
公开/授权文献
- US20080272476A1 Through-Hole Via On Saw Streets 公开/授权日:2008-11-06
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