发明授权
- 专利标题: Electron beam system and method of operating the same
- 专利标题(中): 电子束系统及其操作方法
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申请号: US11873639申请日: 2007-10-17
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公开(公告)号: US07569819B2公开(公告)日: 2009-08-04
- 发明人: Norihisa Mori
- 申请人: Norihisa Mori
- 申请人地址: JP Tokyo
- 专利权人: JEOL Ltd.
- 当前专利权人: JEOL Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: The Webb Law Firm
- 优先权: JP2006-282212 20061017; JP2007-138679 20070525
- 主分类号: H01J37/26
- IPC分类号: H01J37/26
摘要:
An electron beam system (such as a scanning electron microscope or an electron probe microanalyzer) capable of displaying backscattered electron (BSE) images at the same brightness and same contrast at all times if the atomic number differences are the same when illumination conditions including accelerating voltage and emission current are varied or when the specimens are imaged with different instruments.
公开/授权文献
- US20080087821A1 Electron Beam System and Method of Operating the Same 公开/授权日:2008-04-17
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