- 专利标题: Electron beam inspection system and inspection method and method of manufacturing devices using the system
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申请号: US12068484申请日: 2008-02-07
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公开(公告)号: US07569838B2公开(公告)日: 2009-08-04
- 发明人: Kenji Watanabe , Hirosi Sobukawa , Nobuharu Noji , Tohru Satake , Shoji Yoshikawa , Tsutomu Karimata , Mamoru Nakasuji , Masahiro Hatakeyama , Takeshi Murakami , Yuichiro Yamazaki , Ichirota Nagahama , Takamitsu Nagai , Kazuyoshi Sugihara
- 申请人: Kenji Watanabe , Hirosi Sobukawa , Nobuharu Noji , Tohru Satake , Shoji Yoshikawa , Tsutomu Karimata , Mamoru Nakasuji , Masahiro Hatakeyama , Takeshi Murakami , Yuichiro Yamazaki , Ichirota Nagahama , Takamitsu Nagai , Kazuyoshi Sugihara
- 申请人地址: JP Tokyo JP Tokyo
- 专利权人: Ebara Corporation,Kabushiki Kaisha Toshiba
- 当前专利权人: Ebara Corporation,Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo JP Tokyo
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP.
- 优先权: JP2001-002722 20010110; JP2001-075865 20010316; JP2001-092748 20010328; JP2001-125349 20010424; JP2001-189325 20010622
- 主分类号: H01J37/00
- IPC分类号: H01J37/00 ; H01J37/30
摘要:
An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.
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