Invention Grant
- Patent Title: Calibration device for nozzle and calibration method for nozzle
- Patent Title (中): 用于喷嘴的校准装置和喷嘴的校准方法
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Application No.: US12017564Application Date: 2008-01-22
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Publication No.: US07581331B2Publication Date: 2009-09-01
- Inventor: Wai Keong Alvin Wong , Tien Ching Ting , Yong-An Lin , Jin Seng Chan
- Applicant: Wai Keong Alvin Wong , Tien Ching Ting , Yong-An Lin , Jin Seng Chan
- Applicant Address: TW Hsin-Chu
- Assignee: United Microelectronics Corp.
- Current Assignee: United Microelectronics Corp.
- Current Assignee Address: TW Hsin-Chu
- Agent Chun-Ming Shih
- Main IPC: G01B5/25
- IPC: G01B5/25 ; G01B11/27

Abstract:
A calibration device for a nozzle suitable for calibrating a nozzle of a semiconductor apparatus is provided. The semiconductor apparatus includes a chuck with a center hole with radius R1. A cap with outer radius R3 is disposed outside the nozzle with outer radius R2. The calibration device includes a jig including an upper portion, a lower portion and a recess in the front surface of the upper portion. The recess includes an outer portion with depth D1 and radius R4 larger than R3 and an inner portion with depth D2 larger than D1 and radius R5 larger than R2. The lower portion with a radius R6 less than R1 is connected to the back surface of the upper portion for fixing the jig in the center hole. The values of (R4−R3), (R5−R2) and (R1−R6) are in the tolerable calibration inaccuracy range.
Public/Granted literature
- US20090183380A1 CALIBRATION DEVICE FOR NOZZLE AND CALIBRATION METHOD FOR NOZZLE Public/Granted day:2009-07-23
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