CALIBRATION DEVICE FOR NOZZLE AND CALIBRATION METHOD FOR NOZZLE
    1.
    发明申请
    CALIBRATION DEVICE FOR NOZZLE AND CALIBRATION METHOD FOR NOZZLE 有权
    用于喷嘴的校准装置和喷嘴的校准方法

    公开(公告)号:US20090183380A1

    公开(公告)日:2009-07-23

    申请号:US12017564

    申请日:2008-01-22

    CPC classification number: G01B3/34 G01B3/46 G01B7/14 G01B7/31 G01B11/14 G01B11/27

    Abstract: A calibration device for a nozzle suitable for calibrating a nozzle of a semiconductor apparatus is provided. The semiconductor apparatus includes a chuck with a center hole with radius R1. A cap with outer radius R3 is disposed outside the nozzle with outer radius R2. The calibration device includes a jig including an upper portion, a lower portion and a recess in the front surface of the upper portion. The recess includes an outer portion with depth D1 and radius R4 larger than R3 and an inner portion with depth D2 larger than D1 and radius R5 larger than R2. The lower portion with a radius R6 less than R1 is connected to the back surface of the upper portion for fixing the jig in the center hole. The values of (R4−R3), (R5−R2) and (R1−R6) are in the tolerable calibration inaccuracy range.

    Abstract translation: 提供了一种用于校准半导体装置的喷嘴的用于喷嘴的校准装置。 半导体装置包括具有半径为R1的中心孔的卡盘。 具有外半径R3的盖设置在外径R2的喷嘴的外侧。 校准装置包括夹具,该夹具包括在上部的前表面中的上部,下部和凹部。 该凹部包括具有深度D1和半径R4大于R3的外部部分和深度D2大于D1且半径R5大于R2的内部部分。 半径R6小于R1的下部连接到上部的后表面,用于将夹具固定在中心孔中。 (R4-R3),(R5-R2)和(R1-R6)的值在容许的校准误差范围内。

    Calibration device for nozzle and calibration method for nozzle
    2.
    发明授权
    Calibration device for nozzle and calibration method for nozzle 有权
    用于喷嘴的校准装置和喷嘴的校准方法

    公开(公告)号:US07581331B2

    公开(公告)日:2009-09-01

    申请号:US12017564

    申请日:2008-01-22

    CPC classification number: G01B3/34 G01B3/46 G01B7/14 G01B7/31 G01B11/14 G01B11/27

    Abstract: A calibration device for a nozzle suitable for calibrating a nozzle of a semiconductor apparatus is provided. The semiconductor apparatus includes a chuck with a center hole with radius R1. A cap with outer radius R3 is disposed outside the nozzle with outer radius R2. The calibration device includes a jig including an upper portion, a lower portion and a recess in the front surface of the upper portion. The recess includes an outer portion with depth D1 and radius R4 larger than R3 and an inner portion with depth D2 larger than D1 and radius R5 larger than R2. The lower portion with a radius R6 less than R1 is connected to the back surface of the upper portion for fixing the jig in the center hole. The values of (R4−R3), (R5−R2) and (R1−R6) are in the tolerable calibration inaccuracy range.

    Abstract translation: 提供了一种用于校准半导体装置的喷嘴的用于喷嘴的校准装置。 半导体装置包括具有半径为R1的中心孔的卡盘。 具有外半径R3的盖设置在外径R2的喷嘴的外侧。 校准装置包括夹具,该夹具包括在上部的前表面中的上部,下部和凹部。 该凹部包括具有深度D1和半径R4大于R3的外部部分和深度D2大于D1且半径R5大于R2的内部部分。 半径R6小于R1的下部连接到上部的后表面,用于将夹具固定在中心孔中。 (R4-R3),(R5-R2)和(R1-R6)的值在容许的校准误差范围内。

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