发明授权
- 专利标题： Method and apparatus for thin metal film thickness measurement
- 专利标题（中）： 薄金属薄膜厚度测量方法和设备
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申请号： US11713233申请日： 2007-02-28
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公开(公告)号： US07581875B2公开(公告)日： 2009-09-01
- 发明人: Yehiel Gotkis , Mikhail Korolik
- 申请人： Yehiel Gotkis , Mikhail Korolik
- 申请人地址： US CA Fremont
- 专利权人： Lam Research Corporation
- 当前专利权人： Lam Research Corporation
- 当前专利权人地址： US CA Fremont
- 代理机构： Martine Penilla & Gencarella, LLP
- 主分类号： G01N25/00
- IPC分类号： G01N25/00 ; G01K1/00
摘要：
A method for measuring a metal film thickness is provided. The method initiates with heating a region of interest of a metal film with a defined amount of heat energy. Then, a temperature of the metal film is measured. Next, a thickness of the metal film is calculated based upon the temperature and the defined amount of heat energy. A chemical mechanical planarization system capable of detecting a thin metal film through the detection of heat transfer dynamics is also provided.
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