Invention Grant
- Patent Title: Charged particle beam apparatus
- Patent Title (中): 带电粒子束装置
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Application No.: US11401878Application Date: 2006-04-12
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Publication No.: US07582885B2Publication Date: 2009-09-01
- Inventor: Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato , Takashi Furukawa
- Applicant: Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato , Takashi Furukawa
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corp.
- Current Assignee: Hitachi High-Technologies Corp.
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, P.C.
- Priority: JP2005-115233 20050413
- Main IPC: H01J1/50
- IPC: H01J1/50
Abstract:
A small-sized charged particle beam apparatus capable of maintaining high vacuum even during emission of an electron beam is provided. A nonevaporative getter pump is placed upstream of differential pumping of an electron optical system of the charged particle beam apparatus, and a minimum number of ion pumps are placed downstream, so that both the pumps are used in combination. Further, by mounting a detachable coil on an electron gun part, the inside of a column can be maintained under high vacuum with a degree of vacuum in the order of 10−8 Pa.
Public/Granted literature
- US20060231773A1 Charged particle beam apparatus Public/Granted day:2006-10-19
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