Invention Grant
- Patent Title: Method for manufacturing semiconductor laser device and method for inspecting semiconductor laser bar
- Patent Title (中): 半导体激光器件的制造方法及半导体激光棒的检查方法
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Application No.: US12196902Application Date: 2008-08-22
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Publication No.: US07585689B2Publication Date: 2009-09-08
- Inventor: Takayuki Kashima , Keiji Ito , Kouji Makita
- Applicant: Takayuki Kashima , Keiji Ito , Kouji Makita
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: JP2007-217393 20070823
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for manufacturing a semiconductor laser device in which a first conductivity type cladding layer, and active layer, a second conductivity type first cladding layer, and a second conductivity type second cladding layer are laminated in this order on a semiconductor substrate by crystal growth, the second conductivity type second cladding layer is processed into a plurality of stripe-shaped ridge structure portions, and a laser bar is formed by cleavage in a direction orthogonal to a longitudinal direction of the ridge structure portions. According to this method, it is possible to provide a method for manufacturing a semiconductor laser device and a method for inspecting a semiconductor laser bar in the manufacturing process, capable of determining for each chip whether or not a deviation of a resonator length is within the tolerance in a simple manner.
Public/Granted literature
- US20090053838A1 METHOD FOR MANUFACTURING SEMICONDUCTOR LASER DEVICE AND METHOD FOR INSPECTING SEMICONDUCTOR LASER BAR Public/Granted day:2009-02-26
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