发明授权
- 专利标题： Process monitoring system and method for processing a large number of sub-micron measurement targets
- 专利标题（中）： 用于处理大量亚微米测量目标的过程监控系统和方法
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申请号： US10817104申请日： 2004-04-01
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公开(公告)号： US07587700B2公开(公告)日： 2009-09-08
- 发明人: Youval Nehmadi , Zamir Abraham , Gil Sod-Moriah , Yair Eran , Chen Ofek , Yaron Cohen , Ariel Ben-Porath
- 申请人： Youval Nehmadi , Zamir Abraham , Gil Sod-Moriah , Yair Eran , Chen Ofek , Yaron Cohen , Ariel Ben-Porath
- 申请人地址： IL Rehovot
- 专利权人： Applied Materials, Israel, Ltd.
- 当前专利权人： Applied Materials, Israel, Ltd.
- 当前专利权人地址： IL Rehovot
- 代理商 Tarek N. Fahmi
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
The invention provides a method that includes the stages of: (i) receiving design information representative of a portion of an object that includes sub micron measurement targets, (ii) processing the received design information to provide a large number of measurement targets; and (iii) associating target measurement parameters to each of large number of measurement targets.The invention provides a system that includes: (i) an interface for receiving design information representative of a portion of a layer of an object that includes sub micron measurement targets; and (ii) a processor, coupled to the interface, for processing the received design information to provide a large number of measurement targets; and for associating target measurement parameters to each of large number of measurement targets.
公开/授权文献
- US20080092088A1 Process monitoring system and method 公开/授权日：2008-04-17
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