发明授权
- 专利标题： Graded spin-on organic antireflective coating for photolithography
- 专利标题（中）： 梯度旋涂有机抗反射涂层用于光刻
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申请号： US12042709申请日： 2008-03-05
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公开(公告)号： US07588879B2公开(公告)日： 2009-09-15
- 发明人: Colin J. Brodsky , Sean D. Burns , Dario L. Goldfarb , Michael Lercel , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Steven A. Scheer , Libor Vyklicky
- 申请人： Colin J. Brodsky , Sean D. Burns , Dario L. Goldfarb , Michael Lercel , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Steven A. Scheer , Libor Vyklicky
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Connolly Bove Lodge & Hutz LLP
- 代理商 Daniel P. Morris, Esq.
- 主分类号： G03F7/11
- IPC分类号： G03F7/11
摘要：
An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
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