发明授权
US07589039B2 Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same
有权
具有低偏振诱导双折射的合成二氧化硅，其制造方法和包含该双折射的平版印刷装置
- 专利标题： Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same
- 专利标题（中）： 具有低偏振诱导双折射的合成二氧化硅，其制造方法和包含该双折射的平版印刷装置
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申请号： US11241075申请日： 2005-09-30
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公开(公告)号： US07589039B2公开(公告)日： 2009-09-15
- 发明人: Douglas Clippinger Allan , Dana Craig Bookbinder , Ulrich W H Neukirch , Charlene Marie Smith
- 申请人： Douglas Clippinger Allan , Dana Craig Bookbinder , Ulrich W H Neukirch , Charlene Marie Smith
- 申请人地址： US NY Corning
- 专利权人： Corning Incorporated
- 当前专利权人： Corning Incorporated
- 当前专利权人地址： US NY Corning
- 代理商 Robert P. Santandrea; Siwen Chen
- 主分类号： C03C3/06
- IPC分类号： C03C3/06 ; C03B19/00
摘要：
Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm−2·pulse−1 and a pulse length of about 25 ns for 5×109 pulses.
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