Invention Grant
- Patent Title: LPP EUV plasma source material target delivery system
- Patent Title (中): LPP EUV等离子体源材料目标传送系统
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Application No.: US12075631Application Date: 2008-03-12
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Publication No.: US07589337B2Publication Date: 2009-09-15
- Inventor: Alexander N. Bykanov , J. Martin Algots , Oleh V. Khodykin , Oscar Hemberg , Norbert R. Bowering
- Applicant: Alexander N. Bykanov , J. Martin Algots , Oleh V. Khodykin , Oscar Hemberg , Norbert R. Bowering
- Applicant Address: US CA San Diego
- Assignee: Cymer, Inc.
- Current Assignee: Cymer, Inc.
- Current Assignee Address: US CA San Diego
- Main IPC: A61N5/06
- IPC: A61N5/06 ; G01J3/10 ; H05G2/00

Abstract:
An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site.
Public/Granted literature
- US20080179549A1 LPP EUV plasma source material target delivery system Public/Granted day:2008-07-31
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