发明授权
US07592407B2 Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process
有权
可聚合氟化合物，制备方法，聚合物，抗蚀剂组合物和图案化工艺
- 专利标题： Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process
- 专利标题（中）： 可聚合氟化合物，制备方法，聚合物，抗蚀剂组合物和图案化工艺
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申请号： US11259179申请日： 2005-10-27
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公开(公告)号： US07592407B2公开(公告)日： 2009-09-22
- 发明人: Yuji Harada , Jun Hatakeyama , Takeru Watanabe , Takeshi Kinsho
- 申请人： Yuji Harada , Jun Hatakeyama , Takeru Watanabe , Takeshi Kinsho
- 申请人地址： JP Tokyo
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2004-313903 20041028
- 主分类号： C07C69/52
- IPC分类号： C07C69/52
摘要：
A polymerizable fluorinated compound having formula (2a) or (2b) wherein R1 and R2 are H or C1-C20 alkyl or fluoroalkyl, R3 is H, F or C1-C4 alkyl or fluoroalkyl, and R is H or a protective group is polymerized into a fluorinated polymer which is used as a base polymer to formulate a resist composition having transparency to laser light of wavelength≦300 nm, alkali development amenability, and dry etch resistance.