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937 条记录 (耗时 0.041 秒)

    FLUORENE DERIVATIVE, METHOD FOR PRODUCING SAME, AND APPLICATION OF SAME
    1.
    发明申请
    FLUORENE DERIVATIVE, METHOD FOR PRODUCING SAME, AND APPLICATION OF SAME 有权

    公开(公告)号：US20230091908A1

    公开(公告)日：2023-03-23

    申请号：US17788071

    申请日：2020-12-16

    申请人： Osaka Gas Chemicals Co., Ltd.

    发明人： Koji KONISHI ,  Rie YASUDA ,  Shinsuke MIYAUCHI ,  Ibuki MOTOHIRO ,  Mayato MITSUZANE ,  Yuichiro YASUDA

    IPC分类号： C07C69/52 ,  C07C67/08

    摘要： The di(meth)acrylate compound of the present disclosure is represented by the following formula (1): wherein Z1a and Z1b each represent an arene ring, R1a and R1b each represent a substituent, k1 and k2 each denote an integer of not less than 0, m1 and m2 each denote an integer of 0 to 4, and at least one of m1 and m2 denotes 1 or more, R2a and R2b each represent a substituent, n1 and n2 each denote an integer of 0 to 4, m1+n1 and m2+n2 each denote 4 or less, A1a and A1b each represent a straight- or branched-chain alkylene group, A2a and A2b each represent a straight- or branched-chain alkylene group, p1 and p2 each denote an integer of not less than 0, and R3a and R3b each represent a hydrogen atom or a methyl group.
    The di(meth)acrylate compound is a novel compound having a high refractive index.

    RESIST COMPOSITION FOR PATTERN PRINTING AND PATTERN FORMING METHOD
    2.
    发明申请
    RESIST COMPOSITION FOR PATTERN PRINTING AND PATTERN FORMING METHOD 有权

    公开(公告)号：US20210114967A1

    公开(公告)日：2021-04-22

    申请号：US17135734

    申请日：2020-12-28

    申请人： KANEKA CORPORATION

    发明人： Hitoshi TAMAI ,  Masanori KANEMATSU ,  Shimpei OKAMOTO

    IPC分类号： C07C69/52 ,  H01L31/05 ,  G03F7/004 ,  G03F7/20 ,  G03F7/032 ,  G03F7/34

    摘要： A resist composition for pattern printing contains a binder, a filler, a thickener, and a polyfunctional (meth)acrylate. The resist composition does not contain a photoinitiator. The resist composition also contains photocatalytic titanium oxide. A method for forming a pattern includes a resist composition that is pattern-wise printed, and then the resist composition is irradiated with an actinic radiation such that seepage of the resist component from an end of the pattern during the pattern formation using the resist composition is suppressed and the seepage portion is decomposed. As a result, it is possible to drastically reduce the seepage without impairing the rheology of the resist composition and additionally, to remove a slightly seeping portion without requiring, for example, a harmful ozone treatment or the like.

    Liquid crystal composition and liquid crystal display device
    4.
    发明授权
    Liquid crystal composition and liquid crystal display device 有权

    公开(公告)号：US10173959B2

    公开(公告)日：2019-01-08

    申请号：US13557969

    申请日：2012-07-25

    申请人： Yukihiro Fujita ,  Yoshimasa Furusato

    发明人： Yukihiro Fujita ,  Yoshimasa Furusato

    IPC分类号： C09K19/56 ,  C07C69/52 ,  C09K19/30 ,  C09K19/44 ,  C09K19/54 ,  C09K19/02 ,  C09K19/34 ,  G02F1/1333 ,  C09K19/04 ,  C09K19/12 ,  G02F1/137

    摘要： To provide a liquid crystal composition satisfying at least one characteristic such as a high maximum temperature of a nematic phase, a low minimum temperature thereof, a small viscosity, a suitable optical anisotropy, a large negative dielectric anisotropy, a large specific resistance, a high stability to ultraviolet light and heat, or a liquid crystal composition having a suitable balance regarding at least two characteristics, and an AM device having a short response time, a large voltage holding ratio, a large contrast ratio and a long service life; a liquid crystal composition contains a specific compound having a polymerizable group as a first component, and may contain a specific compound having a large negative dielectric anisotropy and a low minimum temperature as a second component or a specific compound having a small viscosity or a large maximum temperature as a third component, and a liquid crystal display device contains the composition.