Invention Grant
- Patent Title: Plasma generation and processing with multiple radiation sources
- Patent Title (中): 具有多种辐射源的等离子体产生和处理
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Application No.: US11590058Application Date: 2006-10-31
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Publication No.: US07592564B2Publication Date: 2009-09-22
- Inventor: Satyendra Kumar , Devendra Kumar
- Applicant: Satyendra Kumar , Devendra Kumar
- Applicant Address: US MA N. Billerica
- Assignee: BTU International Inc.
- Current Assignee: BTU International Inc.
- Current Assignee Address: US MA N. Billerica
- Agency: Weingarten, Schurgin, Gagnebin & Lebovici LLP
- Main IPC: B23K10/00
- IPC: B23K10/00

Abstract:
Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a radiation cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A controller can be used to delay activation of one radiation source with respect to another radiation source.
Public/Granted literature
- US20070164680A1 Plasma generation and processing with multiple radiation sources Public/Granted day:2007-07-19
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