发明授权
- 专利标题： High-voltage discharging reactor processing exhausted hydrogen gas
- 专利标题（中）： 高压放电反应堆处理耗尽氢气
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申请号： US11260427申请日： 2005-10-28
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公开(公告)号： US07594810B2公开(公告)日： 2009-09-29
- 发明人: Chih-Ching Tzeng , Den-Lian Lin , Shiaw-Huei Chen , Ming-Song Yang , Jyh-Ming Yan , Yuh-Jenq Yu
- 申请人： Chih-Ching Tzeng , Den-Lian Lin , Shiaw-Huei Chen , Ming-Song Yang , Jyh-Ming Yan , Yuh-Jenq Yu
- 申请人地址： TW Taoyuan
- 专利权人： Atomic Energy Council - Institute of Nuclear Energy Research
- 当前专利权人： Atomic Energy Council - Institute of Nuclear Energy Research
- 当前专利权人地址： TW Taoyuan
- 代理机构： Troxell Law Office, PLLC
- 主分类号： F23L7/00
- IPC分类号： F23L7/00 ; F23D14/00
摘要：
The present invention provides a reactor utilizing high-voltage discharge for processing exhausted hydrogen gas emitted during membrane plating, etching, or washing of semiconductors, where higher than 95% of destruction and removal efficiency (DRE) of hydrogen gas is obtained.
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