发明授权
- 专利标题: Radiation detecting apparatus, manufacturing method thereof, scintillator panel and radiation detecting system
- 专利标题(中): 辐射检测装置及其制造方法,闪烁体面板和放射线检测系统
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申请号: US11199201申请日: 2005-08-09
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公开(公告)号: US07595493B2公开(公告)日: 2009-09-29
- 发明人: Satoshi Okada , Yoshihiro Ogawa , Masato Inoue , Kazumi Nagano , Shinichi Takeda , Tomoyuki Tamura
- 申请人: Satoshi Okada , Yoshihiro Ogawa , Masato Inoue , Kazumi Nagano , Shinichi Takeda , Tomoyuki Tamura
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2004-233420 20040810
- 主分类号: G01T1/20
- IPC分类号: G01T1/20
摘要:
A radiation detecting apparatus includes a sensor panel 100, a phosphor layer 111 formed on the sensor panel 100 to convert a radiation into light, and a phosphor protecting member 110 covering the phosphor layer 111 to adhere closely to the phosphor protecting member 110. The phosphor protecting member 110 includes a phosphor protecting layer 116 made of vapor deposition polymerization polyimide formed by vapor deposition polymerization, a reflecting layer 113 reflecting the light converted by the phosphor layer 111, and a protecting layer 117 made of vapor deposition polymerization polyurea formed by the vapor deposition polymerization. By such a configuration, a polymerization reaction of the phosphor protecting layer 116 is performed on the substrate. Thereby, the generation of by-products is suppressed to make it easy to acquire the uniformity of film quality. Consequently, the generation of a situation in which structural disorders are generated on the reflection surface of the reflecting layer 113 to cause image defects can be suppressed.
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