METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    2.
    发明申请
    METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
    制造半导体器件的方法

    公开(公告)号:US20120088357A1

    公开(公告)日:2012-04-12

    申请号:US13238997

    申请日:2011-09-21

    IPC分类号: H01L21/265 H01L21/308

    摘要: A method of manufacturing a semiconductor device is disclosed. The method forms a semiconductor device including a workpiece structure having a first region and second region located adjacent to the first region formed therein. The first region includes a first pattern and the second region includes a second pattern having at least a greater pattern width or a smaller aspect ratio than the first pattern. The method includes forming the first pattern by providing a first film having a first contact angle at a top portion thereof and the second pattern by providing a second film having a second contact angle less than the first contact angle at a top portion thereof; cleaning the first and the second regions by a chemical liquid; rinsing the cleaned first and the second regions by a rinse liquid; and drying the rinsed first and the second regions.

    摘要翻译: 公开了制造半导体器件的方法。 该方法形成半导体器件,该半导体器件包括具有第一区域的工件结构和与形成在其中的第一区域相邻的第二区域。 第一区域包括第一图案,第二区域包括具有比第一图案至少更大的图案宽度或更小的纵横比的第二图案。 该方法包括:通过在其顶部提供具有小于第一接触角的第二接触角的第二膜,通过提供在其顶部具有第一接触角的第一膜和第二图案来形成第一图案; 用化学液体清洗第一和第二区域; 用漂洗液冲洗净化的第一和第二区域; 并干燥漂洗的第一和第二区域。

    APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE
    4.
    发明申请
    APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE 审中-公开
    装置和处理半导体基板表面的方法

    公开(公告)号:US20110143545A1

    公开(公告)日:2011-06-16

    申请号:US12879097

    申请日:2010-09-10

    IPC分类号: H01L21/306 B08B3/00

    摘要: In one embodiment, an apparatus of treating a surface of a semiconductor substrate comprises a substrate holding and rotating unit which holds a semiconductor substrate with a surface having a convex pattern formed thereon and rotates the semiconductor substrate, a first supply unit which supplies a chemical and/or pure water to the surface of the semiconductor substrate, and a second supply unit which supplies a diluted water repellent to the surface of the semiconductor substrate to form a water-repellent protective film on the surface of the convex pattern. The second supply unit comprises a buffer tank which stores the water repellent, a first supply line which supplies a purge gas to the buffer tank, a second supply line which supplies a diluent, a pump which sends off the water repellent within the buffer tank, a third supply line which supplies the water repellent sent off from the pump, and a mixing valve which mixes the diluent and the water repellent to produce the diluted water repellent.

    摘要翻译: 在一个实施例中,处理半导体衬底的表面的设备包括:衬底保持和旋转单元,其保持具有形成在其上的凸起图案的表面的半导体衬底,并使半导体衬底旋转,提供化学品的第一供应单元和 /或纯水,以及第二供给单元,其向半导体基板的表面供给稀释斥水剂,以在凸形图案的表面上形成防水保护膜。 第二供应单元包括缓冲罐,其存储防水剂,向缓冲罐供应净化气体的第一供应管线,供应稀释剂的第二供应管线,在缓冲罐内排出拒水剂的泵, 供给从泵送出的防水剂的第三供给管路和将稀释剂与防水剂混合而制成稀释斥水剂的混合阀。

    Radiation detecting apparatus and radiation imaging system using the same
    5.
    发明授权
    Radiation detecting apparatus and radiation imaging system using the same 有权
    辐射检测装置和使用其的放射线成像系统

    公开(公告)号:US07723693B2

    公开(公告)日:2010-05-25

    申请号:US11633448

    申请日:2006-12-05

    IPC分类号: G01T1/24

    摘要: At a radiation incident side of light generating means comprising light guiding means 300 including a light source such as an LED 301, a light guiding plate 303, a reflecting plate 304, a diffusing plate 305, and the like, radiation shielding members 401 to 403 for shielding the radiation are provided. As the radiation shielding members, those absorbing or reflecting 70% of the incident radiation are preferably used. Further, the radiation shielding member is disposed between a radiation detecting panel 500 and a light generating source such as the LED 301 and the like or disposed between the radiation detecting panel and a drive circuit which drives the light source such as the LED 301, and the like.

    摘要翻译: 在发光装置的辐射入射侧包括包括诸如LED 301的光源的导光装置300,导光板303,反射板304,漫射板305等,辐射屏蔽构件401至403 用于屏蔽辐射。 作为辐射屏蔽构件,优选使用吸收或反射70%入射辐射的辐射屏蔽构件。 此外,辐射屏蔽构件设置在辐射检测面板500和诸如LED 301等的发光源之间,或者设置在辐射检测面板和驱动诸如LED 301的光源的驱动电路之间,以及 类似。

    Capacity control valve
    6.
    发明授权
    Capacity control valve 有权
    容量调节阀

    公开(公告)号:US07644729B2

    公开(公告)日:2010-01-12

    申请号:US11922009

    申请日:2006-06-08

    IPC分类号: F16K11/044

    摘要: A capacity control valve has a communication path (31) for communicating a discharge chamber (11) and a control chamber (12); one valve chamber (36) in the middle of the communication path (31); communication paths (32, 31b) for communicating a suction chamber (13) and the control chamber (12); the other valve chamber (36) in the middle of the communication path (32); a valve body (40) including a first valve section (41) that opens and closes the communication path (31) and a second valve section (42) that opens and closes the communication path (32), the first and second valve sections being placed in the valve chamber (36) and performing the opening and closing operation in a manner opposite to each other; and a solenoid (60) for moving the valve body (40). The valve body (40) has a pressure receiving section (44) at its end section that is across the second valve section (42) from the first valve section (41), and the pressure receiving section (44) receives pressure in the control chamber. The pressure receiving area S3 of the pressure receiving section (44) is substantially the same as the difference between the pressure receiving area S2 of the second valve section (42) and the pressure receiving area S1 of the first valve section. The valve is reduced in size, an influence of the pressure in the control chamber is minimized, and stable capacity control with excellent response is enabled.

    摘要翻译: 容量控制阀具有用于连通排出室(11)和控制室(12)的连通路径(31)。 在所述连通路径(31)的中间的一个阀室(36); 用于连通吸入室(13)和控制室(12)的连通路径(32,31b)。 连通路径(32)中间的另一个阀室(36); 包括打开和关闭连通路径(31)的第一阀部分(41)和打开和关闭连通路径(32)的第二阀部分(42)的阀体(40),第一和第二阀部分是 放置在阀室(36)中并以彼此相反的方式进行打开和关闭操作; 以及用于使阀体(40)移动的螺线管(60)。 阀体(40)在其端部处具有与第一阀部(41)相对的第二阀部(42)的压力接收部(44),受压部(44)承受控制中的压力 房间。 受压部(44)的受压面积S3与第二阀部(42)的受压面积S2与第一阀部的受压面积S1的差大致相同。 阀门尺寸减小,控制室内压力的影响最小化,能够实现稳定的容量控制。

    MAGNETIC TONER
    7.
    发明申请
    MAGNETIC TONER 有权
    磁性墨粉

    公开(公告)号:US20090186288A1

    公开(公告)日:2009-07-23

    申请号:US12298755

    申请日:2007-04-25

    IPC分类号: G03G9/083

    摘要: The object of the present invention is to provide a magnetic toner enabling an image with high image density and excellent image reproducibility to be obtained, which is excellent in fluidity, charging stability, and charging uniformity, even for long-term use, and also enabling an image whose fogging, ghost, and scattering are suppressed to be obtained. The magnetic toner has at least a binder resin and a magnetic material, where, the magnetic material is an magnetic iron oxide whose dielectric breakdown voltage of the magnetic material is 160 to 1600 V/cm, and the dielectric loss tangent (tan δ) of the magnetic toner at 100 kHz and 40° C. is 2.0×10−3 to 1.0×10−2.

    摘要翻译: 本发明的目的是提供一种能够获得具有高图像密度和优异的图像再现性的图像的磁性调色剂,即使长期使用也具有优异的流动性,充电稳定性和充电均匀性,并且还使得 抑制雾化,重影和散射的图像。 磁性调色剂至少具有粘合剂树脂和磁性材料,其中磁性材料是磁性材料的介电击穿电压为160至1600V / cm的磁性氧化铁,介电损耗角正切(tanδ)为 在100kHz和40℃下的磁性调色剂为2.0×10 -3至1.0×10 -2。

    Hydrophobic inorganic fine particles, hydrophobic inorganic fine particles production process, and toner
    9.
    发明授权
    Hydrophobic inorganic fine particles, hydrophobic inorganic fine particles production process, and toner 有权
    疏水性无机细颗粒,疏水性无机细颗粒生产工艺和调色剂

    公开(公告)号:US07402368B2

    公开(公告)日:2008-07-22

    申请号:US11681396

    申请日:2007-03-02

    IPC分类号: G03G9/08

    摘要: Hydrophobic inorganic fine particles characterized by being a mixture of at least small-particle-diameter inorganic fine particles having an average primary particle diameter of 5 to 25 nm and having a maximum peak particle diameter of 20 nm or less and large-particle-diameter inorganic fine particles having an average primary particle diameter which is 1.5 to 100 times the average primary particle diameter of the small-particle-diameter inorganic fine particles; the mixture being a mixture having been treated in the same treating tank to subject both the small-particle-diameter inorganic fine particles and large-particle-diameter inorganic fine particles simultaneously to hydrophobic treatment.

    摘要翻译: 疏水性无机细颗粒,其特征在于平均一次粒径为5〜25nm,最大峰值粒径为20nm以下的至少小粒径的无机微粒和大粒径的无机微粒的混合物 平均一次粒径为小粒径无机微粒的平均一次粒径的1.5〜100倍的微粒; 该混合物是在相同处理槽中处理的混合物,同时使小颗粒直径的无机细颗粒和大颗粒直径的无机细颗粒同时进行疏水处理。

    Radiation detecting apparatus, producing method therefor and radiation image pickup system
    10.
    发明授权
    Radiation detecting apparatus, producing method therefor and radiation image pickup system 失效
    辐射检测装置及其制造方法和放射线摄像系统

    公开(公告)号:US07391029B2

    公开(公告)日:2008-06-24

    申请号:US11198229

    申请日:2005-08-08

    IPC分类号: G01T1/20 G01T1/24

    CPC分类号: G01T1/2018

    摘要: A radiation detection apparatus including a sensor panel, having a photoreceiving unit constituted of plural photoelectric converting elements two-dimensionally arranged on a substrate and electrical connecting portions provided in an external portion of the photoreceiving unit and electrically connected to the photoelectric converting elements of respective rows or columns of the photoreceiving unit, a phosphor layer provided at least on the photoreceiving unit for converting a radiation into a light detectable by the photoelectric converting element, and a phosphor protective member covering the phosphor layer and in contact with the sensor panel, characterized in that the phosphor protective member includes a frame member provided between the phosphor layer and the electric connecting portion on the sensor panel, and a phosphor protective layer covering an upper surface of the phosphor layer and provided in close contact with an upper surface of the frame member. This configuration allows to prevent a discharge of an electrostatic charge accumulated on the sensor panel, thereby providing a stable radiation detection apparatus with a high production yield.

    摘要翻译: 一种辐射检测装置,包括传感器面板,具有由二维布置在基板上的多个光电转换元件构成的光接收单元和设置在所述光接收单元的外部的电连接部分,并电连接到各行的光电转换元件 或列,至少设置在光接收单元上用于将辐射转换成可由光电转换元件检测的光的荧光体层和覆盖荧光体层并与传感器面板接触的荧光体保护构件,其特征在于, 荧光体保护构件包括设置在荧光体层和传感器面板上的电连接部分之间的框架构件,以及覆盖荧光体层的上表面并且与框架构件的上表面紧密接触地设置的荧光体保护层 。 这种结构允许防止积聚在传感器面板上的静电电荷的放电,从而提供具有高产量的稳定的放射线检测装置。