发明授权
- 专利标题: Vapor-deposition material for the production of layers of high refractive index
- 专利标题(中): 用于生产高折射率层的蒸镀材料
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申请号: US11249765申请日: 2005-10-14
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公开(公告)号: US07598196B2公开(公告)日: 2009-10-06
- 发明人: Martin Friz , Uwe Anthes , Reiner Dombrowski
- 申请人: Martin Friz , Uwe Anthes , Reiner Dombrowski , Beate Dombrowski, legal representative
- 申请人地址: DE Darmstadt
- 专利权人: Merck Patent GmbH
- 当前专利权人: Merck Patent GmbH
- 当前专利权人地址: DE Darmstadt
- 代理机构: Millen, White, Zelano, Branigan, P.C.
- 优先权: DE102004049996 20041014
- 主分类号: C04B35/495
- IPC分类号: C04B35/495 ; C23C16/40
摘要:
The present invention relates to vapor-deposition materials comprising Ta2Ox, where x=4.81 to 4.88, to processes for the preparation of the vapor-deposition materials, and to the use thereof for the production of layers of high refractive index.