发明授权
US07600213B2 Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program product
有权
图案数据验证方法，图案数据生成方法，曝光掩模制造方法，半导体器件制造方法和计算机程序产品
- 专利标题： Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program product
- 专利标题（中）： 图案数据验证方法，图案数据生成方法，曝光掩模制造方法，半导体器件制造方法和计算机程序产品
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申请号： US11287205申请日： 2005-11-28
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公开(公告)号： US07600213B2公开(公告)日： 2009-10-06
- 发明人: Shigeki Nojima , Akira Hamaguchi
- 申请人： Shigeki Nojima , Akira Hamaguchi
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权： JP2004-344242 20041129
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
A pattern data verification method includes preparing exposure data related to a circuit pattern to be formed on a substrate, calculating a characteristic of an image of an exposure pattern on a resist film to be applied on the substrate, the exposure pattern corresponding to the exposure data, calculating a film thickness of the resist film after being developed based on the characteristic of the image of the exposure pattern, and determining whether the exposure data is acceptable or rejectable based on the film thickness of the resist film after being developed.
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