公开(公告)号：US07600213B2

公开(公告)日：2009-10-06

申请号：US11287205

申请日：2005-11-28

申请人： Shigeki Nojima ,  Akira Hamaguchi

发明人： Shigeki Nojima ,  Akira Hamaguchi

IPC分类号： G06F17/50

CPC分类号： G06F17/5068 ,  G06F2217/12 ,  Y02P90/265

摘要： A pattern data verification method includes preparing exposure data related to a circuit pattern to be formed on a substrate, calculating a characteristic of an image of an exposure pattern on a resist film to be applied on the substrate, the exposure pattern corresponding to the exposure data, calculating a film thickness of the resist film after being developed based on the characteristic of the image of the exposure pattern, and determining whether the exposure data is acceptable or rejectable based on the film thickness of the resist film after being developed.

摘要翻译： 模式数据验证方法包括：准备与要在基板上形成的电路图案有关的曝光数据，计算要施加在基板上的抗蚀剂膜上的曝光图案的图像的特性，对应于曝光数据的曝光图案 基于曝光图案的图像的特性，计算显影后的抗蚀剂膜的膜厚度，并且基于显影后的抗蚀剂膜的膜厚确定曝光数据是否可接受或可否认。

公开(公告)号：US20060136862A1

公开(公告)日：2006-06-22

申请号：US11287205

申请日：2005-11-28

申请人： Shigeki Nojima ,  Akira Hamaguchi

发明人： Shigeki Nojima ,  Akira Hamaguchi

IPC分类号： G06F17/50

CPC分类号： G06F17/5068 ,  G06F2217/12 ,  Y02P90/265

摘要： A pattern data verification method includes preparing exposure data related to a circuit pattern to be formed on a substrate, calculating a characteristic of an image of an exposure pattern on a resist film to be applied on the substrate, the exposure pattern corresponding to the exposure data, calculating a film thickness of the resist film after being developed based on the characteristic of the image of the exposure pattern, and determining whether the exposure data is acceptable or rejectable based on the film thickness of the resist film after being developed.

公开(公告)号：US5276805A

公开(公告)日：1994-01-04

申请号：US530512

申请日：1990-05-30

申请人： Akira Hamaguchi

发明人： Akira Hamaguchi

IPC分类号： G06F17/30 ,  G06F15/20

CPC分类号： G06F17/30265

摘要： An image filing system has first and second image storage devices and a retrieval data storage device. Image data representing a plurality of images are stored in the first image storage device, and retrieval data corresponding to the image data are stored in the retrieval data storage device. Desired image data are specified according to the corresponding retrieval data, and retrieved from the first image storage device and outputted to the second erasable random-access image storage device. Link information which indicates other image data related to the specified image data is added to the retrieval data. When desired image data are specified according to the corresponding retrieval data and retrieved and outputted to the second image storage device, the other image data related to the desired identified image data can quickly and efficiently be retrieved according to the link information.

摘要翻译： 图像归档系统具有第一和第二图像存储装置和检索数据存储装置。 代表多个图像的图像数据被存储在第一图像存储装置中，并且对应于图像数据的检索数据被存储在检索数据存储装置中。 根据相应的检索数据指定期望的图像数据，并且从第一图像存储装置检索并输出到第二可擦除随机存取图像存储装置。 指示与指定图像数据相关的其他图像数据的链接信息被添加到检索数据。 当根据对应的检索数据指定需要的图像数据并且检索并输出到第二图像存储装置时，可以根据链接信息快速有效地检索与期望的所识别的图像数据相关的其他图像数据。

公开(公告)号：US08027812B2

公开(公告)日：2011-09-27

申请号：US12028495

申请日：2008-02-08

申请人： Akira Hamaguchi

发明人： Akira Hamaguchi

IPC分类号： G06F17/50

CPC分类号： G06F17/5009 ,  G06F2217/10

摘要： An embodiment of the present invention is a charge trajectory calculating method which calculates, by simulation, trajectories of charges scattered by irradiating a target object with a charged beam. The method includes: setting a simulation region, which corresponds to the existence region of the target object; dividing the simulation region into a plurality of segment regions; calculating, by a Monte Carlo calculation, the trajectories of charges scattered by irradiating the inside of a predetermined segment region with the charged beam; calculating, based on function values of an approximate function, the potential distribution which occurs in the simulation region by irradiating the outside of the predetermined segment region with the charged beam; and calculating, by a Monte Carlo calculation, and based on the potential distribution calculated based on the function values of the approximate function, the trajectories of charges scattered by irradiating the outside of the predetermined segment region with the charged beam.

摘要翻译： 本发明的实施例是一种充电轨迹计算方法，其通过模拟通过用带电束照射目标物体而散射的电荷的轨迹。 该方法包括：设置对应于目标对象的存在区域的模拟区域; 将模拟区域划分为多个区段区域; 通过蒙特卡洛计算计算通过用带电束照射预定区段区域的内部而散射的电荷的轨迹; 基于近似函数的函数值，通过用所述带电束照射所述预定段区域的外部来计算在所述模拟区域中发生的电位分布; 并且通过蒙特卡洛计算，并且基于基于近似函数的函数值计算的电位分布，通过用带电波束照射预定分段区域的外部而散射的电荷轨迹。

公开(公告)号：US07302091B2

公开(公告)日：2007-11-27

申请号：US10687828

申请日：2003-10-20

申请人： Akira Hamaguchi ,  Takamitsu Nagai

发明人： Akira Hamaguchi ,  Takamitsu Nagai

IPC分类号： G06K9/00

CPC分类号： G06K9/00 ,  G06K2209/19 ,  G06T7/0002 ,  G06T7/0004 ,  G06T7/41 ,  G06T2207/30148

摘要： A method of determining defect detection sensitivity data, comprises: taking image data from the desired surface areas of each of semiconductor devices, processing at least two of the image data through arithmetic operations and comparing the processed image data with a parameter of defect detection sensitivity substituted by predetermined threshold data to obtain information on defects in the desired areas at least in one-to-one correspondence with any of the image data arithmetically processed, repeating more than once the step of varying the parameter of the defect detection sensitivity to obtain the defect information, so as to obtain more than one sets of combination data on a value of the parameter of the defect detection sensitivity correlated with the defect information, processing more than one sets of the combination data to produce a mathematical function expressing a relation of the desired statistical data with the parameter of the defect detection sensitivity, the mathematical function being used to determine defect detection sensitivity data, the defect detection sensitivity data being used in obtaining the information on the defects in the desired surface areas of the semiconductor devices under defect inspection, and the defect detection sensitivity data defining an existence range of the defect information in the image data which are taken from the desired surface areas of each semiconductor device and which are arithmetically processed in the previous step.

摘要翻译： 一种确定缺陷检测灵敏度数据的方法，包括：从每个半导体器件的期望表面区域获取图像数据，通过算术运算处理至少两个图像数据，并将经处理的图像数据与缺陷检测灵敏度取代的参数进行比较 通过预定的阈值数据，以至少与所要求的图像数据一一对应地获得关于期望区域中的缺陷的信息，重复多次，改变缺陷检测灵敏度的参数以获得缺陷 信息，以获得与缺陷信息相关的缺陷检测灵敏度的参数的值的多于一组的组合数据，处理多于一组的组合数据以产生表达所需的关系的数学函数 统计数据与缺陷检测灵敏度的参数，数学 用于确定缺陷检测灵敏度数据的缺陷检测灵敏度数据，用于获得关于缺陷检查期间半导体器件的期望表面区域中的缺陷的信息的缺陷检测灵敏度数据，以及定义缺陷检测灵敏度数据的存在范围的缺陷检测灵敏度数据 图像数据中的缺陷信息，其从每个半导体器件的期望表面区域获取，并且在前一步骤中被算术处理。

公开(公告)号：US20120065941A1

公开(公告)日：2012-03-15

申请号：US13137746

申请日：2011-09-09

申请人： Akira Hamaguchi

发明人： Akira Hamaguchi

IPC分类号： G06F17/50

CPC分类号： G06F17/5009 ,  G06F2217/10

摘要： In one embodiment, a charge trajectory calculating method of calculating, by simulation, trajectories of charges scattered by irradiating a target object with a charged beam includes setting a simulation region, which corresponds to an existence region of the target object, and retrieving measured data of a potential distribution which occurs in the target object by irradiating the target object with the charged beam, from a storage location at which the measured data is stored. The method further includes setting the measured data retrieved from the storage location, as the potential distribution which occurs in the simulation region by irradiating the simulation region with the charged beam, and calculating, by a Monte Carlo calculation, the trajectories of charges scattered by irradiating the simulation region by the charged beam, on an assumption that the measured data retrieved from the storage location is set as the potential distribution in the simulation region.

摘要翻译： 在一个实施例中，通过模拟计算通过用带电波束照射目标物体而散射的电荷的轨迹的计费轨迹计算方法包括设置对应于目标对象的存在区域的模拟区域，并且检索测量数据 从存储测量数据的存储位置，通过用带电束照射目标物体而在目标物体中发生的电位分布。 该方法还包括通过用充电光束照射模拟区域来设置从存储位置检索的测量数据作为在模拟区域中发生的电位分布，并且通过蒙特卡罗计算计算通过辐射散射的电荷轨迹 假设从存储位置检索的测量数据被设置为模拟区域中的电位分布，则由带电波束的模拟区域。

公开(公告)号：US4622827A

公开(公告)日：1986-11-18

申请号：US684722

申请日：1984-12-21

申请人： Ryozo Jabami ,  Akira Hamaguchi ,  Shigeru Matsuda ,  Yasuyuki Ejima

发明人： Ryozo Jabami ,  Akira Hamaguchi ,  Shigeru Matsuda ,  Yasuyuki Ejima

IPC分类号： F24F11/02 ,  F25B1/00 ,  F25B49/02 ,  G05D23/19 ,  G05D23/32

CPC分类号： F25B49/025 ,  G05D23/1912 ,  F25B2600/021 ,  F25B2600/0251 ,  Y02B30/741

摘要： This apparatus selects a start-up mode of operation for controlling the compressor (1) at maximum speed only when the difference between the measured temperature of a room at the start of the operation and a target temperature is larger than a predetermined value. A normal mode of operation otherwise is selected for controlling the compressor (1) at a speed lower than maximum thus extending the life of the compressor (1).

摘要翻译： 该装置仅在操作开始时的房间的测量温度与目标温度之间的差异大于预定值时才以最大速度选择控制压缩机（1）的启动模式。 否则选择正常的操作模式以便以低于最大值的速度控制压缩机（1），从而延长了压缩机（1）的使用寿命。