发明授权
- 专利标题: Charged particle beam apparatus
- 专利标题(中): 带电粒子束装置
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申请号: US11785433申请日: 2007-04-17
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公开(公告)号: US07601974B2公开(公告)日: 2009-10-13
- 发明人: Hiroaki Mito , Katsuhiro Sasada , Kazuo Kato , Tomohiro Kudo , Tomonori Saeki , Yasuo Yahagi , Masayuki Kobayashi
- 申请人: Hiroaki Mito , Katsuhiro Sasada , Kazuo Kato , Tomohiro Kudo , Tomonori Saeki , Yasuo Yahagi , Masayuki Kobayashi
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2005-336461 20051122
- 主分类号: A61N5/00
- IPC分类号: A61N5/00
摘要:
An object of this invention is to provide a charged particle beam apparatus that is capable of handling samples without adhering impurities onto the samples. In a scanning electron microscope in which a lubricant was coated on a sliding portion of a movable member that moves inside a vacuum chamber, a substance from which low molecular components were removed is used as the lubricant. It is thus possible to inhibit sample contamination and suppress the occurrence of defects in a process following measurement of the samples.
公开/授权文献
- US20070187601A1 Charged particle beam apparatus 公开/授权日:2007-08-16
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