Invention Grant
- Patent Title: Dual beam system
- Patent Title (中): 双光束系统
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Application No.: US11641540Application Date: 2006-12-18
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Publication No.: US07601976B2Publication Date: 2009-10-13
- Inventor: Raymond Hill , Colin August Sanford , Lawrence Scipioni , Mark DiManna , Michael Tanguay
- Applicant: Raymond Hill , Colin August Sanford , Lawrence Scipioni , Mark DiManna , Michael Tanguay
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Griner, LLP
- Agent Michael O. Scheinberg; David Griner
- Main IPC: H01J37/30
- IPC: H01J37/30 ; H01L21/266 ; H01L21/263

Abstract:
A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.
Public/Granted literature
- US20080035860A1 Dual beam system Public/Granted day:2008-02-14
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