发明授权
US07601979B2 Gallium nitride-based compound semiconductor multilayer structure and production method thereof 有权
氮化镓基化合物半导体多层结构及其制备方法

Gallium nitride-based compound semiconductor multilayer structure and production method thereof
摘要:
An object of the present invention is to provide a gallium nitride compound semiconductor multilayer structure useful for producing a gallium nitride compound semiconductor light-emitting device which operates at low voltage while maintaining a satisfactory light emission output. The inventive gallium nitride compound semiconductor multilayer structure comprises a substrate, and an n-type layer, an active layer, and a p-type layer formed on the substrate, the active layer being sandwiched by the n-type layer and the p-type layer, and the active layer comprising a thick portion and a thin portion, wherein the active layer has a flat lower surface (on the substrate side) and an uneven upper surface so as to form the thick portion and the thin portion.
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