发明授权
- 专利标题: Gallium nitride-based compound semiconductor multilayer structure and production method thereof
- 专利标题(中): 氮化镓基化合物半导体多层结构及其制备方法
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申请号: US10586849申请日: 2005-01-28
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公开(公告)号: US07601979B2公开(公告)日: 2009-10-13
- 发明人: Hisayuki Miki , Tetsuo Sakurai , Hitoshi Takeda
- 申请人: Hisayuki Miki , Tetsuo Sakurai , Hitoshi Takeda
- 申请人地址: JP Tokyo
- 专利权人: Showa Denko K.K.
- 当前专利权人: Showa Denko K.K.
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2004-021479 20040129
- 国际申请: PCT/JP2005/001642 WO 20050128
- 国际公布: WO2005/074045 WO 20050811
- 主分类号: H01L29/06
- IPC分类号: H01L29/06
摘要:
An object of the present invention is to provide a gallium nitride compound semiconductor multilayer structure useful for producing a gallium nitride compound semiconductor light-emitting device which operates at low voltage while maintaining a satisfactory light emission output. The inventive gallium nitride compound semiconductor multilayer structure comprises a substrate, and an n-type layer, an active layer, and a p-type layer formed on the substrate, the active layer being sandwiched by the n-type layer and the p-type layer, and the active layer comprising a thick portion and a thin portion, wherein the active layer has a flat lower surface (on the substrate side) and an uneven upper surface so as to form the thick portion and the thin portion.
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