发明授权
- 专利标题: Monolithic semiconductor laser and method of manufacturing the same
- 专利标题(中): 单片半导体激光器及其制造方法
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申请号: US11878027申请日: 2007-07-20
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公开(公告)号: US07602830B2公开(公告)日: 2009-10-13
- 发明人: Takehiro Nishida , Motoharu Miyashita , Tsutomu Yamaguchi
- 申请人: Takehiro Nishida , Motoharu Miyashita , Tsutomu Yamaguchi
- 申请人地址: JP Tokyo
- 专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2003-339768 20030930
- 主分类号: H01S5/00
- IPC分类号: H01S5/00
摘要:
A monolithic semiconductor laser having plural semiconductor lasers having different emission wavelengths from each other, including: a semiconductor substrate; a first double hetero-structure formed within a first area on the semiconductor substrate and having first clad layers disposed above and below a first active layer; and a second double hetero-structure formed within a second area on the semiconductor substrate and having second clad layers disposed above and below a second active layer. The first and second active layers are made of different semiconductor materials from each other. The first clad layers above and below the first active layer are of approximately the same semiconductor materials and the second clad layers above and below the second active layer are of approximately the same semiconductor materials.
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