- 专利标题： Charged particle beam alignment method and charged particle beam apparatus
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申请号： US10734261申请日： 2003-12-15
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公开(公告)号： US07605381B2公开(公告)日： 2009-10-20
- 发明人: Mitsugu Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
- 申请人： Mitsugu Sato , Tadashi Otaka , Makoto Ezumi , Atsushi Takane , Shoji Yoshida , Satoru Yamaguchi , Yasuhiko Ozawa
- 申请人地址： JP Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Dickstein Shapiro LLP
- 优先权： JP2001-161588 20010530; JP2001-208674 20010710
- 主分类号： H01L21/027
- IPC分类号： H01L21/027
摘要：
An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.
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