发明授权
- 专利标题: P-type semiconductor zinc oxide films process for preparation thereof, and pulsed laser deposition method using transparent substrates
- 专利标题(中): P型半导体氧化锌膜的制造方法以及使用透明基板的脉冲激光沉积法
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申请号: US11405020申请日: 2006-04-17
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公开(公告)号: US07608308B2公开(公告)日: 2009-10-27
- 发明人: Bing Liu , Zhendong Hu , Yong Che , Yuzuru Uehara
- 申请人: Bing Liu , Zhendong Hu , Yong Che , Yuzuru Uehara
- 申请人地址: US MI Ann Arbor
- 专利权人: Imra America, Inc.
- 当前专利权人: Imra America, Inc.
- 当前专利权人地址: US MI Ann Arbor
- 代理机构: Sughrue Mion, PLLC
- 主分类号: C23C14/30
- IPC分类号: C23C14/30 ; H05B7/00 ; C23C8/00
摘要:
A p-type semiconductor zinc oxide (ZnO) film and a process for preparing the film are disclosed. The film is co-doped with phosphorous (P) and lithium (Li). A pulsed laser deposition scheme is described for use in growing the film. Further described is a process of pulsed laser deposition using transparent substrates which includes a pulsed laser source, a substrate that is transparent at the wavelength of the pulsed laser, and a multi-target system. The optical path of the pulsed laser is arranged in such a way that the pulsed laser is incident from the back of the substrate, passes through the substrate, and then focuses on the target. By translating the substrate towards the target, this geometric arrangement enables deposition of small features utilizing the root of the ablation plume, which can exist in a one-dimensional transition stage along the target surface normal, before the angular width of the plume is broadened by three-dimensional adiabatic expansion. This can provide small deposition feature sizes, which can be similar in size to the laser focal spot, and provides a novel method for direct deposition of patterned materials.
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