发明授权
- 专利标题: Charged particle beam apparatus
- 专利标题(中): 带电粒子束装置
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申请号: US11589821申请日: 2006-10-31
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公开(公告)号: US07615765B2公开(公告)日: 2009-11-10
- 发明人: Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato
- 申请人: Souichi Katagiri , Takashi Ohshima , Toshihide Agemura , Mitsugu Sato
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Mattingly & Malur, P.C.
- 优先权: JP2005-325559 20051110; JP2006-128962 20060508
- 主分类号: A61N5/00
- IPC分类号: A61N5/00 ; G21G5/00
摘要:
There is provided a compact charged particle beam apparatus with a non-evaporable getter pump which maintains high vacuum even during emission of an electron beam without generating foreign particles. The apparatus comprises: a charged particle source; a charged particle optics which focuses a charged particle beam emitted from the charged particle source on a sample and performs scanning; and means of vacuum pumping which evacuates the charged particle optics. The means of vacuum pumping has a differential pumping structure with two or more vacuum chambers connected through an opening in series. A pump made of non-evaporable getter alloy is placed in an upstream vacuum chamber with a high degree of vacuum, and a gas absorbing surface of the non-evaporable getter alloy is fixed without contact with another part.
公开/授权文献
- US20070102650A1 Charged particle beam apparatus 公开/授权日:2007-05-10
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